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3827.59.00.00/PFC Plasma Cleaning Gas Mixture/China

PFC Plasma Cleaning Gas Mixture from China

Perfluorocarbon blend for plasma chamber cleaning in semiconductor fabrication facilities. HTS 3827.59.00.00 for CFC/HCFC-free PFC mixtures. Removes polymer residues without damaging chamber components.

Duty Rate — China → United States

41.2%

Rate breakdown

9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
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Import Tips

• Purity >99.999% ('5N') certification required; include SEMI standard compliance; DOT UN3373 special provisions