PFC-14 Semiconductor Etching Gas Mixture from Mexico
A perfluorocarbon (PFC-14, CF4) based plasma etching mixture used in microchip manufacturing processes. Falls under HTS 3827.59.00.00 due to PFC content without prohibited CFCs or HCFCs. Essential for precise semiconductor fabrication.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.94, articles the product of Mexico, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide TSCA certification for new chemical substances; ensure cylinder meets DOT pressure vessel specs; test for absence of CFCs to maintain 3827.59 classification