3827.59.00.00/PFC-14 Semiconductor Etching Gas Mixture/Japan

PFC-14 Semiconductor Etching Gas Mixture from Japan

A perfluorocarbon (PFC-14, CF4) based plasma etching mixture used in microchip manufacturing processes. Falls under HTS 3827.59.00.00 due to PFC content without prohibited CFCs or HCFCs. Essential for precise semiconductor fabrication.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Provide TSCA certification for new chemical substances; ensure cylinder meets DOT pressure vessel specs; test for absence of CFCs to maintain 3827.59 classification