PFC-14 Semiconductor Etching Gas Mixture from Japan
A perfluorocarbon (PFC-14, CF4) based plasma etching mixture used in microchip manufacturing processes. Falls under HTS 3827.59.00.00 due to PFC content without prohibited CFCs or HCFCs. Essential for precise semiconductor fabrication.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide TSCA certification for new chemical substances; ensure cylinder meets DOT pressure vessel specs; test for absence of CFCs to maintain 3827.59 classification