PFC-14 Semiconductor Etching Gas Mixture from China
A perfluorocarbon (PFC-14, CF4) based plasma etching mixture used in microchip manufacturing processes. Falls under HTS 3827.59.00.00 due to PFC content without prohibited CFCs or HCFCs. Essential for precise semiconductor fabrication.
Duty Rate — China → United States
41.2%
Rate breakdown
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
9903.05.3112.5%Section 301 (forced labor) — additional 12.5% ad valorem on products of China
Import Tips
• Provide TSCA certification for new chemical substances; ensure cylinder meets DOT pressure vessel specs; test for absence of CFCs to maintain 3827.59 classification