HFC-23 Semiconductor Etch Gas Blend from Mexico
Plasma etch gas mixture with HFC-23 for microchip fabrication processes requiring high-purity fluorinated gases. Falls under HTS 3827.51.00.00 because it contains trifluoromethane without CFCs or HCFCs, critical for advanced semiconductor manufacturing.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• 99.999% purity certificates required for semiconductor-grade gases
• DOT hazardous material shipping papers mandatory for compressed gases
• Particle count and moisture content specs needed for cleanroom validation