Photoresist Developer Solution from Japan
An aqueous mixture containing triphenyl sulfonium chloride, diphenyl (4-phenylthio)phenyl sulfonium chloride, and (thiodi-4,1-phenylene)bis(diphenyl sulfonium) dichloride, used as a developer in semiconductor photolithography processes. It falls under HTS 3824.99.2500 because it is a specific aqueous mixture of these aromatic sulfonium compounds exceeding 5% by weight, classified as chemical preparations not elsewhere specified.
Duty Rate — Japan → United States
16.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Verify exact composition matches the subheading's specified sulfonium compounds via lab analysis to avoid misclassification
• Provide Safety Data Sheets (SDS) and technical specs confirming >5% aromatic substances for CBP review