Photoresist Developer Solution from Germany
An aqueous mixture containing triphenyl sulfonium chloride, diphenyl (4-phenylthio)phenyl sulfonium chloride, and (thiodi-4,1-phenylene)bis(diphenyl sulfonium) dichloride, used as a developer in semiconductor photolithography processes. It falls under HTS 3824.99.2500 because it is a specific aqueous mixture of these aromatic sulfonium compounds exceeding 5% by weight, classified as chemical preparations not elsewhere specified.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Verify exact composition matches the subheading's specified sulfonium compounds via lab analysis to avoid misclassification
• Provide Safety Data Sheets (SDS) and technical specs confirming >5% aromatic substances for CBP review