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Photoresist Developer Solution from Canada

An aqueous mixture containing triphenyl sulfonium chloride, diphenyl (4-phenylthio)phenyl sulfonium chloride, and (thiodi-4,1-phenylene)bis(diphenyl sulfonium) dichloride, used as a developer in semiconductor photolithography processes. It falls under HTS 3824.99.2500 because it is a specific aqueous mixture of these aromatic sulfonium compounds exceeding 5% by weight, classified as chemical preparations not elsewhere specified.

Duty Rate — Canada → United States

16.5%

Rate breakdown

9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada

Import Tips

Verify exact composition matches the subheading's specified sulfonium compounds via lab analysis to avoid misclassification

Provide Safety Data Sheets (SDS) and technical specs confirming >5% aromatic substances for CBP review