</>Build with Tariff Intelligence|Programmatic access to tariff calculations and HS code classification.Explore Developer Resources →

Cerium Oxide Polishing Catalyst from Japan

Ceria nanoparticles catalyzing chemical mechanical planarization in semiconductor manufacturing. Classified under 3815.90.3000 as inorganic reaction accelerator.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

ITAR/EAR export controls may apply for semiconductor end-use; obtain validated licenses

Particle size <50nm and zeta potential specs confirm catalytic grade

Radioactive impurity limits (<1ppm) required for cleanroom certification