HFC-125 Semiconductor Processing Gas from Mexico
Ultra-high purity 1,1,1,2,2-Pentafluoroethane for plasma etching in semiconductor manufacturing, HTS 2903.44.10.10. Six-nines purity (99.9999%) for cleanroom applications. Pure organic compound per Chapter 29 definitions.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• Provide particle count and moisture specs; ensure 300mm wafer fab compatibility certification; declare semiconductor end-use for ITAR considerations