HFC-125 Semiconductor Processing Gas from Japan
Ultra-high purity 1,1,1,2,2-Pentafluoroethane for plasma etching in semiconductor manufacturing, HTS 2903.44.10.10. Six-nines purity (99.9999%) for cleanroom applications. Pure organic compound per Chapter 29 definitions.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide particle count and moisture specs; ensure 300mm wafer fab compatibility certification; declare semiconductor end-use for ITAR considerations