HFC-125 Semiconductor Processing Gas from Japan
Ultra-high purity 1,1,1,2,2-Pentafluoroethane for plasma etching in semiconductor manufacturing, HTS 2903.44.10.10. Six-nines purity (99.9999%) for cleanroom applications. Pure organic compound per Chapter 29 definitions.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide particle count and moisture specs; ensure 300mm wafer fab compatibility certification; declare semiconductor end-use for ITAR considerations