HFC-125 Semiconductor Processing Gas from China
Ultra-high purity 1,1,1,2,2-Pentafluoroethane for plasma etching in semiconductor manufacturing, HTS 2903.44.10.10. Six-nines purity (99.9999%) for cleanroom applications. Pure organic compound per Chapter 29 definitions.
Duty Rate — China → United States
13.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide particle count and moisture specs; ensure 300mm wafer fab compatibility certification; declare semiconductor end-use for ITAR considerations