HFC-41 Semiconductor Etchant Gas from China
High-purity Fluoromethane (HFC-41) is critical for plasma etching in microchip fabrication, selectively removing silicon layers. It is directly named in HTS 2903.43.10.00 as a halogenated acyclic hydrocarbon derivative. This gas enables precision in nanoscale semiconductor production.
Duty Rate — China → United States
16.2%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
Import Tips
• Semiconductor industry COA with <1ppm impurities required; comply with REACH if from EU
• Avoid delays by pre-notifying customs of specialty gas status