HFC-41 Semiconductor Etchant Gas from Canada
High-purity Fluoromethane (HFC-41) is critical for plasma etching in microchip fabrication, selectively removing silicon layers. It is directly named in HTS 2903.43.10.00 as a halogenated acyclic hydrocarbon derivative. This gas enables precision in nanoscale semiconductor production.
Duty Rate — Canada → United States
13.7%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Semiconductor industry COA with <1ppm impurities required; comply with REACH if from EU
• Avoid delays by pre-notifying customs of specialty gas status