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2903.43.10.00/HFC-41 Semiconductor Etchant Gas/Canada

HFC-41 Semiconductor Etchant Gas from Canada

High-purity Fluoromethane (HFC-41) is critical for plasma etching in microchip fabrication, selectively removing silicon layers. It is directly named in HTS 2903.43.10.00 as a halogenated acyclic hydrocarbon derivative. This gas enables precision in nanoscale semiconductor production.

Duty Rate — Canada → United States

13.7%

Rate breakdown

9903.05.2910%Section 301 (forced labor) — additional 10% ad valorem on products of Canada
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Import Tips

• Semiconductor industry COA with <1ppm impurities required; comply with REACH if from EU

• Avoid delays by pre-notifying customs of specialty gas status

HFC-41 Semiconductor Etchant Gas from Canada — Import Duty Rate | HTS 2903.43.10.00