Silicon Phosphide from Mexico
Silicon phosphide acts as a precursor for chemical vapor deposition in microelectronics and doping agent for n-type semiconductors. Classified as a nonmetal phosphide under HTS 2853.90.50.00 per subheading 'of other metals or nonmetals'. Meets Chapter 28 chemical definition requirements.
Duty Rate — Mexico → United States
10%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
Import Tips
• Provide CVD process compatibility certificates; ensure <1000ppm oxygen contamination
• Classify as UN3464 for air shipment (toxic, flammable solid)