Silicon Phosphide from Japan

Silicon phosphide acts as a precursor for chemical vapor deposition in microelectronics and doping agent for n-type semiconductors. Classified as a nonmetal phosphide under HTS 2853.90.50.00 per subheading 'of other metals or nonmetals'. Meets Chapter 28 chemical definition requirements.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Provide CVD process compatibility certificates; ensure <1000ppm oxygen contamination

• Classify as UN3464 for air shipment (toxic, flammable solid)