Silicon Phosphide from Japan
Silicon phosphide acts as a precursor for chemical vapor deposition in microelectronics and doping agent for n-type semiconductors. Classified as a nonmetal phosphide under HTS 2853.90.50.00 per subheading 'of other metals or nonmetals'. Meets Chapter 28 chemical definition requirements.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Provide CVD process compatibility certificates; ensure <1000ppm oxygen contamination
• Classify as UN3464 for air shipment (toxic, flammable solid)