Tungsten Silicide Sputtering Target from Germany
High-purity tungsten silicide sputtering targets deposit thin films for CMOS gates in semiconductors. As unworked silicide of tungsten, classified HTS 2850.00.10.00 before fabrication into wafers. Supplied as disc or rectangular blocks >99.9% pure.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Except for products described in headings 9903.05.85–9903.05.92 and 9903.05.97, articles the product of a member state of the European Union, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 10 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Measure planarity <10μm to confirm unworked status per chapter note on electronic forms
• ITAR/EAR dual-use declaration if defense-related end-use suspected
• Silicon stoichiometry analysis prevents metal silicide misclassification