Tungsten Nitride Sputtering Target from Germany
WSixNy composition sputtering targets create copper diffusion barriers in IC manufacturing. Unworked nitride of tungsten for HTS 2850.00.10.00 before thin film deposition. Density >15g/cc, purity 99.5%.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• XRD pattern confirmation required showing WN crystal phase
• Uniformity specification <5% thickness variation defines unworked status
• Section 232 steel/aluminum tariffs may apply to bonding plate materials