Tungsten Nitride Sputtering Target from China
WSixNy composition sputtering targets create copper diffusion barriers in IC manufacturing. Unworked nitride of tungsten for HTS 2850.00.10.00 before thin film deposition. Density >15g/cc, purity 99.5%.
Duty Rate — China → United States
40.5%
Rate breakdown
9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• XRD pattern confirmation required showing WN crystal phase
• Uniformity specification <5% thickness variation defines unworked status
• Section 232 steel/aluminum tariffs may apply to bonding plate materials