2849.90.20.00/Chromium Carbide Sputtering Target/Japan

Chromium Carbide Sputtering Target from Japan

Dense chromium carbide (Cr3C2) disc used as a sputtering target for thin-film deposition in semiconductor and optical coating production. Classified under HTS 2849.90.20.00 as chemically defined chromium carbide in unworked form. Not considered a finished optical element.

Duty Rate — Japan → United States

14.2%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
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Import Tips

• Provide documentation proving it's chemically defined Cr3C2 per Chapter 28 Note 1 to prevent reclassification

• Declare exact dimensions and purity; targets over certain sizes may trigger additional scrutiny

• Comply with REACH-like regulations for chromium compounds; include toxicity data

Chromium Carbide Sputtering Target from Japan — Import Duty Rate | HTS 2849.90.20.00