Chromium Carbide Sputtering Target from Japan
Dense chromium carbide (Cr3C2) disc used as a sputtering target for thin-film deposition in semiconductor and optical coating production. Classified under HTS 2849.90.20.00 as chemically defined chromium carbide in unworked form. Not considered a finished optical element.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Provide documentation proving it's chemically defined Cr3C2 per Chapter 28 Note 1 to prevent reclassification
• Declare exact dimensions and purity; targets over certain sizes may trigger additional scrutiny
• Comply with REACH-like regulations for chromium compounds; include toxicity data