Chromium Carbide Sputtering Target from China

Dense chromium carbide (Cr3C2) disc used as a sputtering target for thin-film deposition in semiconductor and optical coating production. Classified under HTS 2849.90.20.00 as chemically defined chromium carbide in unworked form. Not considered a finished optical element.

Duty Rate — China → United States

39.2%

Rate breakdown

9903.03.0110%Except for products described in headings 9903.03.02–9903.03.11, articles the product of any country, as provided for in subdivision (aa) of U.S. note 2 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)

Import Tips

Provide documentation proving it's chemically defined Cr3C2 per Chapter 28 Note 1 to prevent reclassification

Declare exact dimensions and purity; targets over certain sizes may trigger additional scrutiny

Comply with REACH-like regulations for chromium compounds; include toxicity data