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Gallium Chloride Oxide

Gallium chloride oxide (GaOCl) applied in LED manufacturing and semiconductors. Imports under HTS 2827.49.5000 as other.

Import Duty Rates by Country of Origin

Origin CountryMFN RateCh.99 SurchargesTotal Effective Rate
🇨🇳China5.5%—5.5%
🇲🇽Mexico5.5%—5.5%
🇨🇦Canada5.5%—5.5%
🇩🇪Germany5.5%—5.5%
🇯🇵Japan5.5%—5.5%

Alternative Classifications

This product could be classified differently depending on its characteristics or intended use.

2827.39Higher: 16.2% vs 5.5%

If gallium trichloride

Pure vs oxide forms.

3824.99Higher: 17.5% vs 5.5%

If doping solution prep

Mixtures to 3824.

Not sure which classification is right?

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Import Tips & Compliance

• ITAR/EAR export control checks

• High purity (>99.99%) verification

• Avoid mixture with organics (Ch29)

Related Products under HTS 2827.49.50.00

Zirconium Oxychloride

Zirconium oxychloride (ZrOCl2·8H2O) is a chloride oxide of zirconium used in water treatment, textile processing, and as a precursor for zirconia ceramics. It falls under HTS 2827.49.5000 as an 'other' chloride oxide, distinct from specific chlorides like aluminum or calcium chloride oxides.

Hafnium Oxychloride

Hafnium oxychloride (HfOCl2) is a rare earth chloride oxide used in nuclear reactor components and high-temperature alloys. Classified in HTS 2827.49.5000 as an 'other' chloride oxide not specified elsewhere in the subheading.

Niobium Oxychloride

Niobium oxychloride (NbOCl3) serves as a catalyst in chemical synthesis and precursor for superconducting materials. It is categorized under HTS 2827.49.5000 for other chloride oxides and hydroxides.

Tantalum Oxychloride

Tantalum oxychloride (TaOCl3) is utilized in electronics for capacitor production and as a flame retardant. Falls under HTS 2827.49.5000 as an unspecified chloride oxide.

Molybdenum Oxychloride

Molybdenum oxychloride (MoOCl4) acts as a reagent in organic synthesis and lubricant additive production. Imported under HTS 2827.49.5000 for other chloride oxides.

Tungsten Oxychloride

Tungsten oxychloride (WOCl4) is employed in chemical vapor deposition for thin films and catalyst manufacturing. Classifies in HTS 2827.49.5000 as other chloride oxide.