2825.90.30.00/High-Purity Tungsten Oxide Sputtering Target/Mexico

High-Purity Tungsten Oxide Sputtering Target from Mexico

99.99% pure WO3 targets for physical vapor deposition in semiconductor manufacturing. HTS 2825.90.30.00 as shaped metal oxide, not excluded unless optical element or alloy. Purity level supports chemically defined status.

Duty Rate — Mexico → United States

5.5%

Rate breakdown

9903.03.030%Articles the product of any country, as provided for in subdivision (aa)(ii) of U.S. note 2 to this subchapter
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Import Tips

• ICP-MS purity certificate mandatory to justify high-purity chemical classification

• Declare target dimensions and backing material separately if composite construction

• ESD-safe packaging required for cleanroom compatibility

High-Purity Tungsten Oxide Sputtering Target from Mexico — Import Duty Rate | HTS 2825.90.30.00