High-Purity Tungsten Oxide Sputtering Target from China
99.99% pure WO3 targets for physical vapor deposition in semiconductor manufacturing. HTS 2825.90.30.00 as shaped metal oxide, not excluded unless optical element or alloy. Purity level supports chemically defined status.
Duty Rate — China → United States
30.5%
Rate breakdown
9903.91.0125%Effective with respect to entries on or after September 27, 2024, articles the product of China, as provided for in subdivision (b) of U.S. note 31 to this subchapter
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• ICP-MS purity certificate mandatory to justify high-purity chemical classification
• Declare target dimensions and backing material separately if composite construction
• ESD-safe packaging required for cleanroom compatibility