Germanium Oxide Sputtering Target Material from Japan
GeO2 powder for thin film deposition targets. Pure oxide powder form before target fabrication stays in HTS 2825.60.00 chemical classification.
Duty Rate — Japan → United States
3.7%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Sputtering yield documentation distinguishing powder from finished targets
• Target bonding preparation status requires fabrication process description
• Water vapor transmission rate testing for high-k dielectric applications