Electronic-Grade Germanium Dioxide Sputtering Target Material from Mexico
Ultra-pure GeO2 for use in sputtering targets to deposit germanium oxide films in microelectronics. Classified in HTS 2825.60.00.10 as pure germanium dioxide oxide. Vital for thin-film transistors and solar cells.
Duty Rate — Mexico → United States
3.7%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Certify electronic-grade purity (>5N); comply with Wassenaar Arrangement for high-tech materials; use proper ESD-safe packaging