Electronic-Grade Germanium Dioxide Sputtering Target Material from Japan
Ultra-pure GeO2 for use in sputtering targets to deposit germanium oxide films in microelectronics. Classified in HTS 2825.60.00.10 as pure germanium dioxide oxide. Vital for thin-film transistors and solar cells.
Duty Rate — Japan → United States
3.7%
Rate breakdown
9903.05.860%Universal product exemption (U.S. note 52(b))
Import Tips
• Certify electronic-grade purity (>5N); comply with Wassenaar Arrangement for high-tech materials; use proper ESD-safe packaging