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High Purity PbO Sputtering Target Material from Japan

99.99% pure lead monoxide targets for thin-film deposition in electronics. Qualifies under HTS 2824.90.50.00 as pure lead oxide, not worked forms excluded by Chapter notes.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

Import Tips

Provide vacuum packaging certificates for cleanroom compatibility

Declare sputtering end-use to distinguish from optical elements

Comply with export control for semiconductor materials