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2812.90.00.10/Sulfur Hexafluoride Semiconductor Processing Gas/Japan

Sulfur Hexafluoride Semiconductor Processing Gas from Japan

UHP SF6 for plasma etching in 300mm wafer fabrication (etchant for silicon dioxide). Electronically pure per Chapter notes under HTS 2812.90.0010.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
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Import Tips

• Particle and moisture specs critical for acceptance

• Semiconductor supply chain reporting under CHIPS Act

• Special gas cabinets required for storage

Sulfur Hexafluoride Semiconductor Processing Gas from Japan — Import Duty Rate | HTS 2812.90.00.10