Sulfur Hexafluoride Semiconductor Processing Gas from Germany
UHP SF6 for plasma etching in 300mm wafer fabrication (etchant for silicon dioxide). Electronically pure per Chapter notes under HTS 2812.90.0010.
Duty Rate — Germany → United States
10%
Rate breakdown
9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
Import Tips
• Particle and moisture specs critical for acceptance
• Semiconductor supply chain reporting under CHIPS Act
• Special gas cabinets required for storage