Ultra-High Purity Sulfur Dioxide 99.999% Electronics from Japan
5N pure SO2 gas for semiconductor doping and plasma etching processes. Meets HTS 2811.29.30.00 as chemically pure inorganic oxygen compound of sulfur. Supplied in specialized cleanroom cylinders.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Semiconductor industry requires particle count <10/partical; helium leak testing certification; ITAR/EAR export control screening