Colloidal Silica Dispersion (50% Solids) from Japan
Colloidal silica is a stable suspension of amorphous silicon dioxide nanoparticles in water or solvent, used for chemical mechanical polishing in semiconductors. It qualifies under HTS 2811.22.5000 as silicon dioxide in a chemically defined colloidal form.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Specify 'aqueous dispersion of silicon dioxide' on invoices; concentration >30% solids keeps it as the compound, not a mixture
• Include stability and pH data to prove it's a true colloidal solution under Chapter 28 definitions