Colloidal Silica Dispersion (50% Solids) from Japan
Colloidal silica is a stable suspension of amorphous silicon dioxide nanoparticles in water or solvent, used for chemical mechanical polishing in semiconductors. It qualifies under HTS 2811.22.5000 as silicon dioxide in a chemically defined colloidal form.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Specify 'aqueous dispersion of silicon dioxide' on invoices; concentration >30% solids keeps it as the compound, not a mixture
• Include stability and pH data to prove it's a true colloidal solution under Chapter 28 definitions