Semiconductor Cleaning HF from Mexico
Dilute 0.5% HF for native oxide removal in wafer fabrication. Remains hydrogen fluoride under HTS 2811.11.00.00 due to chemical definition in Chapter 28. Shipped in high-purity Teflon bottles.
Duty Rate — Mexico → United States
0%
Rate breakdown
9903.05.860%Articles provided for in subdivision (b) of U.S. note 52 to this subchapter
Import Tips
• Particle count specs mandatory; cleanroom shipping protocols
• Low concentration risks mixture classification