High-Purity Polyphosphoric Acid for Semiconductor Etching from Japan
Ultra-pure polyphosphoric acid (99%+), free of metallic impurities, used in microelectronics for wafer etching and doping. Falls under HTS 2809.20.00.40 as a chemically defined polyphosphoric acid per Chapter 28 notes.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• Submit impurity analysis (<1 ppm metals) to justify 'chemically defined' status
• Use cleanroom-compatible packaging; declare as high-tech material for possible duty relief
• Comply with ITAR/EAR if destined for semiconductor defense applications