High-Purity Polyphosphoric Acid for Semiconductor Etching from China
Ultra-pure polyphosphoric acid (99%+), free of metallic impurities, used in microelectronics for wafer etching and doping. Falls under HTS 2809.20.00.40 as a chemically defined polyphosphoric acid per Chapter 28 notes.
Duty Rate — China → United States
37.5%
Rate breakdown
9903.05.3112.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of China, as provided for in U.S. note 52 to this subchapter
9903.88.0325%Except as provided in headings 9903.88.13, 9903.88.18, 9903.88.33, 9903.88.34, 9903.88.35, 9903.88.36, 9903.88.37, 9903.88.38, 9903.88.40, 9903.88.41, 9903.88.43, 9903.88.45, 9903.88.46, 9903.88.48, 9903.88.56, 9903.88.64, 9903.88.66, 9903.88.67, 9903.88.68, or 9903.88.69, articles the product of China, as provided for in U.S. note 20(e) to this subchapter and as provided for in the subheadings enumerated in U.S. note 20(f)
Import Tips
• Submit impurity analysis (<1 ppm metals) to justify 'chemically defined' status
• Use cleanroom-compatible packaging; declare as high-tech material for possible duty relief
• Comply with ITAR/EAR if destined for semiconductor defense applications