Nitric Acid 65% Semiconductor Grade from Japan
Ultra-pure nitric acid 65% HNO3 for wafer cleaning in semiconductor fabrication, with metal impurities <1 ppb. Classified in HTS 2808.00.0010 as it remains chemically defined HNO3 without excluded additives. High purity aligns with Chapter 28 requirements for inorganic acids.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Except for products described in headings 9903.05.85–9903.05.92, articles the product of Japan, with an ad valorem (or ad valorem equivalent) rate of duty under column 1 less than 12.5 percent, as provided for in U.S. note 52 to this subchapter
Import Tips
• Require ICP-MS analysis certificates proving trace metal specs; ship in PFA-lined containers to maintain purity; declare under TSCA PMN if novel impurities present