2806.10.00.00/Semiconductor Etch Hydrochloric Acid/Japan

Semiconductor Etch Hydrochloric Acid from Japan

Trace-metal-free 25% HCl for wafer cleaning in chip fabrication. Ultra-pure hydrogen chloride in 2806.10.00.00, Chapter 28 compliant excluding doped forms. E-beam certified.

Duty Rate — Japan → United States

12.5%

Rate breakdown

9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%

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Import Tips

• Class 1 cleanroom cert req

• Teflon-lined only

• Fab ramp-up forecasting