Argon for Semiconductor Manufacturing from Mexico
Hyper-pure argon (6N purity) in tonner cylinders for sputter deposition and plasma etching in wafer fabrication cleanrooms. Falls precisely under HTS 2804.21.00.00 as elemental rare gas argon, unworked gaseous form.
Duty Rate — Mexico → United States
13.7%
Rate breakdown
9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
Import Tips
• ICP-MS certificates mandatory for purity claims; cleanroom packaging prevents contamination claims at entry
• Note ITAR restrictions if destined for defense semiconductors