Argon for Semiconductor Manufacturing from Japan
Hyper-pure argon (6N purity) in tonner cylinders for sputter deposition and plasma etching in wafer fabrication cleanrooms. Falls precisely under HTS 2804.21.00.00 as elemental rare gas argon, unworked gaseous form.
Duty Rate — Japan → United States
12.5%
Rate breakdown
9903.05.4912.5%Section 301 (forced labor) — Japan (col1 rate < 12.5 percent): MFN < 12.5% → total duty capped at 12.5%
Import Tips
• ICP-MS certificates mandatory for purity claims; cleanroom packaging prevents contamination claims at entry
• Note ITAR restrictions if destined for defense semiconductors