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2620.60.90.00/Thallium Gallium Arsenide Etch Residue/Mexico

Thallium Gallium Arsenide Etch Residue from Mexico

Etch residue from semiconductor GaAs wafer processing with thallium dopants, for metal recovery. Industrial residue under HTS 2620.60.90.00.

Duty Rate — Mexico → United States

10%

Rate breakdown

9903.05.5510%Section 301 (forced labor) — additional 10% ad valorem on products of Mexico
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Import Tips

• ,ITAR check for defense-related GaAs processes

• Nano-scale particles; special filtration declarations