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2620.60.90.00/Thallium Gallium Arsenide Etch Residue/Germany

Thallium Gallium Arsenide Etch Residue from Germany

Etch residue from semiconductor GaAs wafer processing with thallium dopants, for metal recovery. Industrial residue under HTS 2620.60.90.00.

Duty Rate — Germany → United States

10%

Rate breakdown

9903.05.3910%Section 301 (forced labor) — European Union member state (col1 rate < 10 percent): MFN < 10% → total duty capped at 10%
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Import Tips

• ,ITAR check for defense-related GaAs processes

• Nano-scale particles; special filtration declarations