Reticles Defect Scanner from Mexico
A high-precision scanner for inspecting reticle defects in extreme ultraviolet (EUV) lithography masks used in advanced semiconductor nodes. It utilizes UV light and AI algorithms for sub-10nm defect detection. This is an other optical measuring instrument under tariff item 9031.49.90.
Duty Rate — Mexico → Canada
0%
Import Tips
• Document the UV light-based inspection method to support classification under 9031.49.90
• Check if the scanner is eligible for duty remission under semiconductor equipment programs
• Ensure the import declaration includes the AI algorithm details if requested by CBSA