Photomask Pattern Analyzer from China
An automated analyzer that measures critical dimensions and overlay accuracy on photomasks for semiconductor production. It uses interferometry to verify pattern fidelity against design data, making it an optical measuring instrument. This is classified under tariff item 9031.49.90.
Duty Rate — China → Canada
0%
Import Tips
• Include technical documentation on the interferometric measurement method for CBSA classification
• Check if the analyzer is eligible for duty remission under the Customs Tariff's semiconductor equipment provisions
• Ensure the goods are declared as optical measuring instruments, not as general laboratory equipment