Nova V-R series OCD Metrology Tool from United States
An Optical Critical Dimension (OCD) scatterometry system for semiconductor wafer film thickness and profile measurement using spectroscopic ellipsometry. Non-destructive process control for advanced nodes, this tool falls under 9031.41.00 as it inspects semiconductor wafers or devices.
Duty Rate — United States → Canada
0%
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• Declare under 9031.41.00 as an optical instrument for semiconductor wafer inspection
• Provide technical specifications to CBSA showing its use in semiconductor manufacturing
• Verify eligibility for duty remission