Lasertec M5650 EUV Blank Inspection System from United States
An extreme ultraviolet (EUV) blank inspection system using actinic wavelength optics for multilayer defect detection on EUV photomasks. Essential for 3nm and below semiconductor nodes, this system falls under 9031.41.00 as it inspects photomasks or reticles.
Duty Rate — United States → Canada
0%
Import Tips
• Declare under 9031.41.00 as an optical instrument for inspecting semiconductor photomasks
• Have technical specifications ready to demonstrate its EUV-specific use
• Check for duty-free entry under trade agreements