Lasertec M5650 EUV Blank Inspection System from Germany
An extreme ultraviolet (EUV) blank inspection system using actinic wavelength optics for multilayer defect detection on EUV photomasks. Essential for 3nm and below semiconductor nodes, this system falls under 9031.41.00 as it inspects photomasks or reticles.
Duty Rate — Germany → Canada
0%
PGA flags
No agency flag on this HTS number in the CBSA Single Window matching criteria.
CBSA Single Window matching criteria, unknown
Import Tips
• Declare under 9031.41.00 as an optical instrument for inspecting semiconductor photomasks
• Have technical specifications ready to demonstrate its EUV-specific use
• Check for duty-free entry under trade agreements