Titanium Sputtering Target for PVD Systems from Mexico
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within 8543.70 apparatus.
Duty Rate — Mexico → Canada
0%
Import Tips
• Declare as a part of PVD apparatus under 8543.70; provide purity and dimensions
• Ensure it is not classified as a base metal article of Section XV
• Confirm the target is not a finished product for other uses