Titanium Sputtering Target for PVD Systems from China
A high-purity titanium disc used as the source material in physical vapor deposition (PVD) apparatus for depositing thin titanium films on substrates. It is specifically designed for magnetron sputtering modules within 8543.70 apparatus.
Duty Rate — China → Canada
PGA flags (1)Show detailsHide detailsHCConsumer Products SafetyMay be required
- HC
Consumer Products Safety · May be required
May require HC Consumer Products Safety depending on intended use (HC21) and Canadian product category (HC29, HC30, HC31, HC32, HC33, HC34, HC35, HC36, HC37); or intended use (HC22, HC23, HC24, HC26, HC27) and Canadian product category (HC37). Matching criteria: Equal To 8543900000; Equal To 8543900000. Logic: MATCH IF (Valid HS Code) AND (Intended Use Code) AND (Valid Canadian Product Category).
CBSA Single Window matching criteria, unknown
Import Tips
• Declare as a part of PVD apparatus under 8543.70; provide purity and dimensions
• Ensure it is not classified as a base metal article of Section XV
• Confirm the target is not a finished product for other uses