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PVD Substrate Heater Element from United States

A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. It is designed for integration into physical vapor deposition apparatus of subheading 8543.70, essential for controlling film properties.

Duty Rate — United States → Canada

0%
PGA flags (1)Show detailsHCConsumer Products SafetyMay be required
  • HC

    Consumer Products Safety · May be required

    May require HC Consumer Products Safety depending on intended use (HC21) and Canadian product category (HC29, HC30, HC31, HC32, HC33, HC34, HC35, HC36, HC37); or intended use (HC22, HC23, HC24, HC26, HC27) and Canadian product category (HC37). Matching criteria: Equal To 8543900000; Equal To 8543900000. Logic: MATCH IF (Valid HS Code) AND (Intended Use Code) AND (Valid Canadian Product Category).

CBSA Single Window matching criteria, unknown

Import Tips

• Declare as a part of PVD apparatus under 8543.70; provide specifications on heating capacity

• Ensure it is not classified as an electro-thermic appliance of heading 8516

• Confirm the heater is not a standalone apparatus