PVD Substrate Heater Element from Germany
A resistively heated platform that maintains substrate temperatures up to 800°C during PVD film deposition. It is designed for integration into physical vapor deposition apparatus of subheading 8543.70, essential for controlling film properties.
Duty Rate — Germany → Canada
0%
Import Tips
• Declare as a part of PVD apparatus under 8543.70; provide specifications on heating capacity
• Ensure it is not classified as an electro-thermic appliance of heading 8516
• Confirm the heater is not a standalone apparatus